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Cover image for Ultrafast laser processing : from micro- to nanoscale
Title:
Ultrafast laser processing : from micro- to nanoscale
Publication Information:
Singapore : Pan Stanford Publishing, 2013
Physical Description:
xviii, 597 p. : ill. ; 24 cm.
ISBN:
9789814267335

9789814303699

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30000010318752 TA1677 U48 2013 Open Access Book Book
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Summary

Summary

Over the past few decades, the rapid development of ultrafast lasers, such as femtosecond lasers and picosecond lasers, has opened up new avenues for material processing due to their unique features such as ultrashort pulse width and extremely high peak intensity. These techniques have become a common tool for micro- and nanoprocessing of a variety of materials and are now widely used for both fundamental researches and practical applications.

This book is composed of 12 chapters covering relevant topics of ultrafast laser processing, including laser itself and novel beam manipulation methods for processing, fundamentals of ultrafast laser processing, nanomaterial synthesis, surface micro- and nanostructuring, micromachining, two-photon photopolymerization, internal modification/fabrication of transparent materials, applications to photonic devices and microchips for biological analysis, industrial applications, and so on. Each chapter is written by world-leading scientists in the related field so as to give comprehensive reviews in the field of ultrafast laser micro- and nanoprocessing.


Author Notes

Koji Sugioka is a senior research scientist at RIKEN and a guest professor at Tokyo University of Science and Tokyo Denki University, Japan. He received his PhD in electronics from Waseda University, Japan, in 1993. Since he joined RIKEN in 1986, he has been working on laser materials processing. His current interests center on the development of advanced laser micro/nanoprocessing, with applications related to lab-on-a-chip, photonic, and electronic devices. His accomplishments include 7 awards, about 130 articles, and about 80 invited talks at international conferences. He is the editor-in-chief of the Journal of Laser Micro/Nanoengineering , a board member of the Laser Institute of America and Japan Laser Processing Society, and an SPIE Fellow.

Ya Cheng is a professor of the Shanghai Institute of Optics and Fine Mechanics (SIOM), Chinese Academy of Sciences, and the deputy director of the State Key Laboratory of High Field Laser Physics, SIOM. He received his BS from Fudan University, China, in 1993 and PhD from SIOM in 1998. Since 1995, he has been working in the fields related to ultrafast photonics. His current research interests include femtosecond laser micromachining, ultrafast nonlinear optics, and strong-field laser physics. He has published more than 100 papers in peer-reviewed journals and given more than 60 invited talks at international conferences. He is an editor of Laser Micro/Nanoengineering and Chinese Physics Letters and the deputy secretary general of the Chinese Optical Society.


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