Title:
Thin film processes
ISBN:
9780127282503
Subject Term:
Available:*
Library | Item Barcode | Call Number | Material Type | Item Category 1 | Status |
|---|---|---|---|---|---|
Searching... | 30000000717763 | TK7871.15.F5 T55 1978 | Open Access Book | Book | Searching... |
Searching... | 30000001758733 | TK7871.15.F5 T55 1978 | Open Access Book | Book | Searching... |
On Order
Summary
Summary
Remarkable advances have been made in recent years in the science and technology of thin film processes for deposition and etching. It is the purpose of this book to bring together tutorial reviews of selected filmdeposition and etching processes from a process viewpoint. Emphasis is placed on the practical use of the processes to provide working guidelines for their implementation, a guide to the literature, and an overview of each process.
Table of Contents
| IntroductionJ.L. Vossen and W. Kern |
| Glow Discharge Plasma and Sources for Etching and DepositionS.M. Rossnagel |
| Evaporation ProcessesC.V. Deshpandey and R.F. Bunshah |
| Molecular Beam EpitaxyP.P. Chow |
| Sputter Deposition ProcessesR. Parsons |
| The Cathodic Arc Plasma Deposition of Thin FilmsP.C. Johnson |
| Thermal Chemical Vapor DepositionK.F. Jensen and W. Kern |
| Metal-Organic Chemical Vapor DepositionK.F. Jensen and T. Kuech |
| Photochemical Vapor DepositionJ.G. Eden |
| Sol-Gel CoatingsL.C. Klein |
| Plasma-Enhanced Chemical Vapor DepositionR. Reif and W. Kern |
| Formation of Inorganic Films by Remote Plasma-Enhanced Chemical-Vapor DepositionG. Lucovsky and D.V. Tsu and R.A. Rudder and R.J. Markunas |
| Selected Area ProcessingT.M. Mayer and S.D. Allen |
| Plasma-Assisted EtchingH.W. Lehman |
| Ion Beam EtchingP.R. Puckett and S.L. Michel and W.E. Hughes |
| Laser-Driven EtchingC.I.H. Ashby |
