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Cover image for Thin films and heterostructures for oxide electronics
Title:
Thin films and heterostructures for oxide electronics
Personal Author:
Series:
Multifunctional thin film series
Publication Information:
New York, NY : Springer, 2005
ISBN:
9780387258027

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30000010129632 TK7871 O42 2005 Open Access Book Book
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Summary

Summary

Oxides form a broad subject area of research and technology development which encompasses different disciplines such as materials science, solid state chemistry, physics etc. The aim of this book is to demonstrate the interplay of these fields and to provide an introduction to the techniques and methodologies involving film growth, characterization and device processing. The literature in this field is thus fairly scattered in different research journals covering one or the other aspect of the specific activity. This situation calls for a book that will consolidate this information and thus enable a beginner as well as an expert to get an overall perspective of the field, its foundations, and its projected progress.


Table of Contents

Ferroelectrics, Nano-scale phenomena, High k Dielectrics
Nanoscale Phenomena in Ferroelectric Thin Films
High-K Candidates for use as the Gate Dielectric in Silicon MOSFETs
Science and Technology of High-Dielectric Constant (K) Thin Films for Next Generation CMOS
Magnetic Memory and Spintronics
Materials Requirements for Magnetic Random-Access Memory (MRAM) Devices
Maganites, Magnetite, and Double-Perovskite Thin Films and Heterostructures
Diluted Magnetic Semiconductors and Insulators
Diluted Magnetic Oxide Systems
Epitaxial Growth and Properties of Magnetically Doped TiO2
Interfaces and Surfaces: Correlated Electron Systems
Interfaces in Materials with Correlated Electron Systems
Electronic Reconstruction at Surfaces and Interfaces of Correlated Electron Materials
Wide Band Gap Semiconductors
Wide Band Gap ZnO and ZnMgO Heterostructures for Future Optoelectronic Devices
Combinatorial Synthesis and Materials Discovery
Combinatorial Synthesis of Functional Metal Oxide Thin Films
Film Growth and Real-Time in situ Characterization
Real-Time Growth Monitoring by High-Pressure RHEED during Pulsed Laser Deposition
Recent Advances in the Deposition of Multi-Component Oxide Films by Pulsed Energy Deposition
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