Run-to-run control in semiconductor manufacturing

Run-to-run (R2R) control is cutting-edge technology that allows modification of a product recipe between machine "runs," thereby minimizing process drift, shift, and variability-and with them, costs. Its effectiveness has been demonstrated in a variety of processes, such as vapor phase epitaxy, lithography, and chemical mechanical planarization. The only barrier to the semiconductor industry's widespread adoption of this highly effective process control is a lack of understanding of the technology. Run to Run Control in Semiconductor Manufacturing overcomes that barrier by offering in-depth analyses of R2R control.

James Moyne and Arnon M. HurwitzTaber H. Smith and Duane S. Boning and James MoyneEnrique Del Castillo and Arnon M. HurwitzWilliam MoyneEnrique Del CastilloArnon M. Hurwitz and Enrique Del CastilloZhe Ning and James Moyne and Taber Smith and Duane Boning and Enrique Del Castillo and Jinn-Yi Yeh and Arnon M. HurwitzJames Moyne and Joe WhiteJames MoyneJames MoyneJames MoyneJames MoyneEnrique Del Castillo and Jinn-Yi Yeh and James Moyne and Victor SolakhianArnon Hurwitz and James MoyneEnrique Del CastilloJames Moyne and Chadi El Chemali and Kareemullah Khan and Rock Nadeau and Paul Smith and John Colt and Jonathan Chapple-Sokol and Tarun ParikhNital S. Patel and Robert SoperArgon Chen and Ruey-Shan GuoJames MoyneRuey-Shan Guo and Argon Chen and Jin-Jung ChenNauman Chaudhry and James Moyne and Elke A. Rundensteiner

Introduction	p. 1
Part 1 Foundation for Control
Chapter 1 Process Control in the Semiconductor Industry	p. 15
Chapter 2 Process Control and Optimization Methods for Run-to-Run Application	p. 45
Part 2 R2R Control Algorithms
Chapter 3 Basic R2R Control Algorithms	p. 67
Chapter 4 Learning and Optimization Algorithms for an Optimizing Adaptive Quality Controller	p. 81
Chapter 5 An Adaptive Run-to-Run Optimizing Controller for Linear and Nonlinear Processes	p. 91
Chapter 6 A Comparative Analysis of Run-to-Run Control Algorithms in the Semiconductor Manufacturing Industry	p. 101
Part 3 Integrating Control
Chapter 7 Existing and Envisioned Control Environment for Semiconductor Manufacturing	p. 115
Chapter 8 Design Requirements for an Integrative R2R Control Solution	p. 125
Chapter 9 The Generic Cell Controller	p. 131
Chapter 10 Derivation of a Piggyback Run-to-Run Control Solution Design	p. 165
Chapter 11 Integrated Run-to-Run Control Solution Examples	p. 177
Chapter 12 Design and Optimization of an Optimizing Adaptive Quality Controller, Generic Cell Controller Enabled Solution	p. 191
Part 4 Customization Methodology
Chapter 13 Case Study: Furnace Capability Improvement Using a Customized Run-to-Run Control Solution	p. 203
Chapter 14 Process Recipe Optimization	p. 219
Part 5 Case Studies
Chapter 15 Multizone Uniformity Control of a CMP Process Utilizing a Pre- and Postmeasurement Strategy	p. 231
Chapter 16 Control of Photolithography Alignment	p. 249
Chapter 17 Age-Based Double EWMA Controller and Its Application to a CMP Process	p. 261
Part 6 Advanced Topics
Chapter 18 Advancements in Chemical Mechanical Planarization Process Automation and Control	p. 279
Chapter 19 An Enhanced Exponentially Weighted Moving Average Controller for Processes Subject to Random Disturbances	p. 289
Chapter 20 Enabling Generic Interprocess Multistep Control: the Active Controller	p. 309
Part 7 Summary and Conclusions	p. 325
List of Acronyms	p. 335
Index	p. 337

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