Title:
Chemical vapor deposition of tungsten and tungsten silicides : for VLSI/ULSI applications
Personal Author:
Publication Information:
Westwood, N. J. : Noyes Publications, 1992
ISBN:
9780815512882
Available:*
Library | Item Barcode | Call Number | Material Type | Item Category 1 | Status |
---|---|---|---|---|---|
Searching... | 30000003570649 | TK7871.15.T85 S34 1992 | Open Access Book | Book | Searching... |
On Order
Summary
Summary
This monograph condenses the relevant and pertinent literature on blanket and selective CVD of tungsten (W) into a single manageable volume. The book supplies the reader with the necessary background to bring up, fine tune, and successfully maintain a CVD-W process in a production set-up. Materials deposition chemistry, equipment, process technology, developments, and applications are described.
Table of Contents
Introduction |
The Blanket Tungsten Approach |
The Selective Tungsten Approach |
Blanket Versus Selective Tungsten |
Tungsten as Interconnect Material |
The Chemistry of CVD-W and Properties of Tungsten |
The Deposition Equipment |
Miscellaneous |
Chemical Vapor Deposition of Tungsten Silicide |
References |
Author Index |
Subject Index |
Appendix: Unit Cells of W and WSi2 |