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Title:
Development of very high frequency plasma enhanced chemical vapour deposition for nanostructure silicon carbide thin film deposition
Personal Author:
Publication Information:
Johor Bahru, Johor : Universiti Teknologi Malaysia, 2016
Physical Description:
xxvi, 226 pages : illustrations (some colors) ; 30 cm
General Note:
Also available in CD-ROM : CP 064586 ra
Supervisors : Dr. Abd. Kahmim Ismail, Prof. Dr. Samsudi Sakrani, Prof. Dr. Zulkafli Othaman, Prof. Dr. Yussof Wahab
Added Corporate Author:
DSP_DISSERTATION:
Thesis (Ph.D (Fizik)) - Universiti Teknologi Malaysia, 2016
Available:*
Library | Item Barcode | Call Number | Material Type | Item Category 1 | Status |
---|---|---|---|---|---|
Searching... | 35000000023501 | XX(863338.3) | Closed Access Thesis | UTM PhD Thesis (Closed Access) | Searching... |
Searching... | 36000000001750 | XX(863338.2) | Closed Access Thesis | UTM PhD Thesis (Open Shelves) | Searching... |