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1. 
Cover image for Sputtering materials for VLSI and thin film devices
2. 
Cover image for Surface morphology and optical properties of copper nitride thin film synthesized by DC sputtering
3. 
Cover image for Surface morphology and optical properties of copper nitride thin film synthesized by DC sputtering
4. 
Cover image for Nanofabrication by ion-beam sputtering : fundamentals and applications
5. 
Cover image for Electrical properties of copper nitride thin film prepared by reactive DC sputtering
6. 
Cover image for Electrical properties of copper nitride thin film prepared by reactive DC sputtering
7. 
Cover image for Sputtering by particle bombardment : experiments and computer calculations from threshold to MeV energies
8. 
Cover image for Sputtering yield calculations using an interatomic potential with the shell effect and new local model
9. 
Cover image for Dynamical simulation for sputtering of B4C
10. 
Cover image for Sputtering yield formula for B4C irradiated with monoenergetic ions at normal incidence
11. 
Cover image for Energy dependence of ion-induced sputtering yields from monoatomic solids at normal incidence
12. 
Cover image for Sputtering by particle bombardment III : Characteristics of sputtered particles, technical applications
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