Title:
Chemical vapor deposition of tungsten and tungsten silicides : for VLSI/ULSI applications
Personal Author:
Publication Information:
Westwood, N. J. : Noyes Publications, 1992
ISBN:
9780815512882
Available:*
Library | Item Barcode | Call Number | Material Type | Item Category 1 | Status |
|---|---|---|---|---|---|
Searching... | 30000003570649 | TK7871.15.T85 S34 1992 | Open Access Book | Book | Searching... |
On Order
Summary
Summary
This monograph condenses the relevant and pertinent literature on blanket and selective CVD of tungsten (W) into a single manageable volume. The book supplies the reader with the necessary background to bring up, fine tune, and successfully maintain a CVD-W process in a production set-up. Materials deposition chemistry, equipment, process technology, developments, and applications are described.
Table of Contents
| Introduction |
| The Blanket Tungsten Approach |
| The Selective Tungsten Approach |
| Blanket Versus Selective Tungsten |
| Tungsten as Interconnect Material |
| The Chemistry of CVD-W and Properties of Tungsten |
| The Deposition Equipment |
| Miscellaneous |
| Chemical Vapor Deposition of Tungsten Silicide |
| References |
| Author Index |
| Subject Index |
| Appendix: Unit Cells of W and WSi2 |
