Title:
Polymers for high technology : electronics and photonics
Series:
ACS symposium series; 346
Publication Information:
Washington, D C : American Chemical Society, 1987
ISBN:
9780841214064
Available:*
Library | Item Barcode | Call Number | Material Type | Item Category 1 | Status |
|---|---|---|---|---|---|
Searching... | 30000001839624 | TK7871.15.P6 P65 1987 | Open Access Book | Book | Searching... |
Searching... | 30000002278780 | TK7871.15.P6 P65 1987 | Open Access Book | Book | Searching... |
On Order
Summary
Summary
Examines the ongoing electronic and photonic revolution and the fundamental, chemically related principles underlying these technologies. Provides reports on definitive advances in relatively mature technologies, and offers a better understanding of the new materials and processes needed to meet the demands of tomorrow's technology. Will serve as the stepping stone to further advances in polymer technology for chemists in both the industrial and academic sphere.
Table of Contents
| Development of Radiation Chemistry Ionizing |
| Radiation on Condensed Systems |
| Radiation Effects in Polymers Main |
| Reactions of Chlorine- and Silicon-Containing Resists |
| Relations Between Photochemistry and Radiation Chemistry |
| Characteristics of a Two-layer Resist System |
| Phenolic Resin-Based Negative Resists |
| Electron-Beam Sensitivity of Acrylate Resists |
| A ""One-Layer"" Multilayer Resist |
| Silicon-Containing Electron-Beam Resist |
| Systems Lithographic Evaluation of Copolymers Acid-Catalyzed Thermo |
