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Summary
Summary
Contributions from well known and respected researchers throughout the world
Thorough coverage of electronic and opto-electronic materials that today's electrical engineers, material scientists and physicists need
Interdisciplinary approach encompasses research in disciplines such as materials science, electrical engineering, chemical engineering, mechanical engineering, physics and chemistry
Author Notes
Safa Kasap is currently a Professor and Canada Research Chair in Electronic Materials and Devices in the Electrical Engineering Department at the University of Saskatchewan, Canada. He obtained his BSc (1976), MSc (1978) and PhD (1983) degrees from the Imperial College of Science, Technology and Medicine, University of London, specializing in amorphous semiconductors and chalcogenide glasses. In 1996 he was awarded the DSc (Engineering) from London University for his research contributions to materials science in electrical engineering. He is a Fellow of the Institution of Electrical Engineers, the Institute of Physics and the Institute of Materials. His research interests are in amorphous semiconductors, glasses for photonics, photoconductors, electrical, optical and thermal properties of materials, and related topics, with more than one hundred refereed journal papers in these areas. He is the Deputy Editor of the Journal of Materials Science: Materials in Electronics (Springer), and a Series Editor for the Series on Materials in Electronic and Optoelectronics (Wiley).
Peter Capper has worked for the same company (through several name changes) for over 30 years in the area of II-VI compounds for infrared applications, latterly as a Materials Team Leader in charge of group of scientists working on the growth and characterisation of these compounds. This has been mainly in the area of cadmium mercury telluride and cadmium telluride, the premier infrared materials, by a range of bulk and epitaxial techniques. He has given several invited talks in Japan, USA and Europe, has coauthored over 100 Journal papers, holds one patent and has edited/written 5 books in the field since 1987. He is on the Editorial Board of the J. Mater. Sci.: Mater. Electron. (Springer) and is a Series Editor for Wiley on Materials for Electronics and Optoelectronics.
Table of Contents
List of Abbreviations | p. XXIX |
Introduction | |
1 Perspectives on Electronic and Optoelectronic Materials | p. 3 |
1.1 The Early Years | p. 4 |
1.2 The Silicon Age | p. 4 |
1.3 The Compound Semiconductors | p. 8 |
1.4 From Faraday to Today | p. 14 |
References | p. 14 |
Part A Fundamental Properties | |
2 Electrical Conduction in Metals and Semiconductors | p. 19 |
2.1 Fundamentals: Drift Velocity, Mobility and Conductivity | p. 20 |
2.2 Matthiessen's Rule | p. 22 |
2.3 Resistivity of Metals | p. 23 |
2.4 Solid Solutions and Nordheim's Rule | p. 26 |
2.5 Carrier Scattering in Semiconductors | p. 28 |
2.6 The Boltzmann Transport Equation | p. 29 |
2.7 Resistivity of Thin Polycrystalline Films | p. 30 |
2.8 Inhomogeneous Media. Effective Media Approximation | p. 32 |
2.9 The Hall Effect | p. 35 |
2.10 High Electric Field Transport | p. 37 |
2.11 Avalanche | p. 38 |
2.12 Two-Dimensional Electron Gas | p. 39 |
2.13 One Dimensional Conductance | p. 41 |
2.14 The Quantum Hall Effect | p. 42 |
References | p. 44 |
3 Optical Properties of Electronic Materials: Fundamentals and Characterization | p. 47 |
3.1 Optical Constants | p. 47 |
3.2 Refractive Index | p. 50 |
3.3 Optical Absorption | p. 53 |
3.4 Thin Film Optics | p. 70 |
3.5 Optical Materials | p. 74 |
References | p. 76 |
4 Magnetic Properties of Electronic Materials | p. 79 |
4.1 Traditional Magnetism | p. 81 |
4.2 Unconventional Magnetism | p. 93 |
References | p. 99 |
5 Defects in Monocrystalline Silicon | p. 101 |
5.1 Technological Impact of Intrinsic Point Defects Aggregates | p. 102 |
5.2 Thermophysical Properties of Intrinsic Point Defects | p. 103 |
5.3 Aggregates of Intrinsic Point Defects | p. 104 |
5.4 Formation of OSF Ring | p. 115 |
References | p. 117 |
6 Diffusion in Semiconductors | p. 121 |
6.1 Basic Concepts | p. 122 |
6.2 Diffusion Mechanisms | p. 122 |
6.3 Diffusion Regimes | p. 123 |
6.4 Internal Electric Fields | p. 126 |
6.5 Measurement of Diffusion Coefficients | p. 126 |
6.6 Hydrogen in Semiconductors | p. 127 |
6.7 Diffusion in Group IV Semiconductors | p. 128 |
6.8 Diffusion in III-V Compounds | p. 130 |
6.9 Diffusion in II-VI Compounds | p. 131 |
6.10 Conclusions | p. 133 |
6.11 General Reading and References | p. 133 |
References | p. 133 |
7 Photoconductivity in Materials Research | p. 137 |
7.1 Steady State Photoconductivity Methods | p. 138 |
7.2 Transient Photoconductivity Experiments | p. 142 |
References | p. 146 |
8 Electronic Properties of Semiconductor Interfaces | p. 147 |
8.1 Experimental Database | p. 149 |
8.2 IFIGS-and-Electronegativity Theory | p. 153 |
8.3 Comparison of Experiment and Theory | p. 155 |
8.4 Final Remarks | p. 159 |
References | p. 159 |
9 Charge Transport in Disordered Materials | p. 161 |
9.1 General Remarks on Charge Transport in Disordered Materials | p. 163 |
9.2 Charge Transport in Disordered Materials via Extended States | p. 167 |
9.3 Hopping Charge Transport in Disordered Materials via Localized States | p. 169 |
9.4 Concluding Remarks | p. 184 |
References | p. 185 |
10 Dielectric Response | p. 187 |
10.1 Definition of Dielectric Response | p. 188 |
10.2 Frequency-Dependent Linear Responses | p. 190 |
10.3 Information Contained in the Relaxation Response | p. 196 |
10.4 Charge Transport | p. 208 |
10.5 A Few Final Comments | p. 211 |
References | p. 211 |
11 Ionic Conduction and Applications | p. 213 |
11.1 Conduction in Ionic Solids | p. 214 |
11.2 Fast Ion Conduction | p. 216 |
11.3 Mixed Ionic-Electronic Conduction | p. 221 |
11.4 Applications | p. 223 |
11.5 Future Trends | p. 226 |
References | p. 226 |
Part B Growth and Characterization | |
12 Bulk Crystal Growth - Methods and Materials | p. 231 |
12.1 History | p. 232 |
12.2 Techniques | p. 233 |
12.3 Materials Grown | p. 240 |
12.4 Conclusions | p. 251 |
References | p. 251 |
13 Single-Crystal Silicon: Growth and Properties | p. 255 |
13.1 Overview | p. 256 |
13.2 Starting Materials | p. 257 |
13.3 Single-Crystal Growth | p. 258 |
13.4 New Crystal Growth Methods | p. 266 |
References | p. 268 |
14 Epitaxial Crystal Growth: Methods and Materials | p. 271 |
14.1 Liquid-Phase Epitaxy (LPE) | p. 271 |
14.2 Metalorganic Chemical Vapor Deposition (MOCVD) | p. 280 |
14.3 Molecular Beam Epitaxy (MBE) | p. 290 |
References | p. 299 |
15 Narrow-Bandgap II-VI Semiconductors: Growth | p. 303 |
15.1 Bulk Growth Techniques | p. 304 |
15.2 Liquid-Phase Epitaxy (LPE) | p. 308 |
15.3 Metalorganic Vapor Phase Epitaxy (MOVPE) | p. 312 |
15.4 Molecular Beam Epitaxy (MBE) | p. 317 |
15.5 Alternatives to CMT | p. 320 |
References | p. 321 |
16 Wide-Bandgap II-VI Semiconductors: Growth and Properties | p. 325 |
16.1 Crystal Properties | p. 326 |
16.2 Epitaxial Growth | p. 328 |
16.3 Bulk Crystal Growth | p. 333 |
16.4 Conclusions | p. 339 |
References | p. 340 |
17 Structural Characterization | p. 343 |
17.1 Radiation-Material Interactions | p. 344 |
17.2 Particle-Material Interactions | p. 345 |
17.3 X-Ray Diffraction | p. 348 |
17.4 Optics, Imaging and Electron Diffraction | p. 351 |
17.5 Characterizing Functional Activity | p. 362 |
17.6 Sample Preparation | p. 362 |
17.7 Case Studies - Complementary Characterization of Electronic and Optoelectronic Materials | p. 364 |
17.8 Concluding Remarks | p. 370 |
References | p. 370 |
18 Surface Chemical Analysis | p. 373 |
18.1 Electron Spectroscopy | p. 373 |
18.2 Glow-Discharge Spectroscopies (GDOES and GDMS) | p. 376 |
18.3 Secondary Ion Mass Spectrometry (SIMS) | p. 377 |
18.4 Conclusion | p. 384 |
19 Thermal Properties and Thermal Analysis: Fundamentals, Experimental Techniques and Applications | p. 385 |
19.1 Heat Capacity | p. 386 |
19.2 Thermal Conductivity | p. 391 |
19.3 Thermal Expansion | p. 396 |
19.4 Enthalpic Thermal Properties | p. 398 |
19.5 Temperature-Modulated DSC (TMDSC) | p. 403 |
References | p. 406 |
20 Electrical Characterization of Semiconductor Materials and Devices | p. 409 |
20.1 Resistivity | p. 410 |
20.2 Hall Effect | p. 418 |
20.3 Capacitance-Voltage Measurements | p. 421 |
20.4 Current-Voltage Measurements | p. 426 |
20.5 Charge Pumping | p. 428 |
20.6 Low-Frequency Noise | p. 430 |
20.7 Deep-Level Transient Spectroscopy | p. 434 |
References | p. 436 |
Part C Materials for Electronics | |
21 Single-Crystal Silicon: Electrical and Optical Properties | p. 441 |
21.1 Silicon Basics | p. 441 |
21.2 Electrical Properties | p. 451 |
21.3 Optical Properties | p. 472 |
References | p. 478 |
22 Silicon-Germanium: Properties, Growth and Applications | p. 481 |
22.1 Physical Properties of Silicon-Germanium | p. 482 |
22.2 Optical Properties of SiGe | p. 488 |
22.3 Growth of Silicon-Germanium | p. 492 |
22.4 Polycrystalline Silicon-Germanium | p. 494 |
References | p. 497 |
23 Gallium Arsenide | p. 499 |
23.1 Bulk Growth of GaAs | p. 502 |
23.2 Epitaxial Growth of GaAs | p. 507 |
23.3 Diffusion in Gallium Arsenide | p. 511 |
23.4 Ion Implantation into GaAs | p. 513 |
23.5 Crystalline Defects in GaAs | p. 514 |
23.6 Impurity and Defect Analysis of GaAs (Chemical) | p. 517 |
23.7 Impurity and Defect Analysis of GaAs (Electrical) | p. 518 |
23.8 Impurity and Defect Analysis of GaAs (Optical) | p. 521 |
23.9 Assessment of Complex Heterostructures | p. 522 |
23.10 Electrical Contacts to GaAs | p. 524 |
23.11 Devices Based on GaAs (Microwave) | p. 524 |
23.12 Devices based on GaAs (Electro-optical) | p. 527 |
23.13 Other Uses for GaAs | p. 532 |
23.14 Conclusions | p. 532 |
References | p. 533 |
24 High-Temperature Electronic Materials: Silicon Carbide and Diamond | p. 537 |
24.1 Material Properties and Preparation | p. 540 |
24.2 Electronic Devices | p. 547 |
24.3 Summary | p. 557 |
References | p. 558 |
25 Amorphous Semiconductors: Structure, Optical, and Electrical Properties | p. 565 |
25.1 Electronic States | p. 565 |
25.2 Structural Properties | p. 568 |
25.3 Optical Properties | p. 570 |
25.4 Electrical Properties | p. 573 |
25.5 Light-Induced Phenomena | p. 575 |
25.6 Nanosized Amorphous Structure | p. 577 |
References | p. 578 |
26 Amorphous and Microcrystalline Silicon | p. 581 |
26.1 Reactions in SiH[subscript 4] and SiH[subscript 4]/H[subscript 2] Plasmas | p. 581 |
26.2 Film Growth on a Surface | p. 583 |
26.3 Defect Density Determination for a-Si:H and [Mu]c-Si:H | p. 589 |
26.4 Device Applications | p. 590 |
26.5 Recent Progress in Material Issues Related to Thin-Film Silicon Solar Cells | p. 591 |
26.6 Summary | p. 594 |
References | p. 594 |
27 Ferroelectric Materials | p. 597 |
27.1 Ferroelectric Materials | p. 601 |
27.2 Ferroelectric Materials Fabrication Technology | p. 608 |
27.3 Ferroelectric Applications | p. 616 |
References | p. 622 |
28 Dielectric Materials for Microelectronics | p. 625 |
28.1 Gate Dielectrics | p. 630 |
28.2 Isolation Dielectrics | p. 647 |
28.3 Capacitor Dielectrics | p. 647 |
28.4 Interconnect Dielectrics | p. 651 |
28.5 Summary | p. 653 |
References | p. 653 |
29 Thin Films | p. 659 |
29.1 Deposition Methods | p. 661 |
29.2 Structure | p. 682 |
29.3 Properties | p. 692 |
29.4 Concluding Remarks | p. 708 |
References | p. 711 |
30 Thick Films | p. 717 |
30.1 Thick Film Processing | p. 718 |
30.2 Substrates | p. 720 |
30.3 Thick Film Materials | p. 721 |
30.4 Components and Assembly | p. 724 |
30.5 Sensors | p. 728 |
References | p. 731 |
Part D Materials for Optoelectronics and Photonics | |
31 III-V Ternary and Quaternary Compounds | p. 735 |
31.1 Introduction to III-V Ternary and Quaternary Compounds | p. 735 |
31.2 Interpolation Scheme | p. 736 |
31.3 Structural Parameters | p. 737 |
31.4 Mechanical, Elastic and Lattice Vibronic Properties | p. 739 |
31.5 Thermal Properties | p. 741 |
31.6 Energy Band Parameters | p. 743 |
31.7 Optical Properties | p. 748 |
31.8 Carrier Transport Properties | p. 750 |
References | p. 751 |
32 Group III Nitrides | p. 753 |
32.1 Crystal Structures of Nitrides | p. 755 |
32.2 Lattice Parameters of Nitrides | p. 756 |
32.3 Mechanical Properties of Nitrides | p. 757 |
32.4 Thermal Properties of Nitrides | p. 761 |
32.5 Electrical Properties of Nitrides | p. 766 |
32.6 Optical Properties of Nitrides | p. 777 |
32.7 Properties of Nitride Alloys | p. 791 |
32.8 Summary and Conclusions | p. 794 |
References | p. 795 |
33 Electron Transport Within the III-V Nitride Semiconductors, GaN, AIN, and InN: A Monte Carlo Analysis | p. 805 |
33.1 Electron Transport Within Semiconductors and the Monte Carlo Simulation Approach | p. 806 |
33.2 Steady-State and Transient Electron Transport Within Bulk Wurtzite GaN, AIN, and InN | p. 810 |
33.3 Electron Transport Within III-V Nitride Semiconductors: A Review | p. 822 |
33.4 Conclusions | p. 826 |
References | p. 826 |
34 II-IV Semiconductors for Optoelectronics: CdS, CdSe, CdTe | p. 829 |
34.1 Background | p. 829 |
34.2 Solar Cells | p. 829 |
34.3 Radiation Detectors | p. 834 |
34.4 Conclusions | p. 840 |
References | p. 840 |
35 Doping Aspects of Zn-Based Wide-Band-Gap Semiconductors | p. 843 |
35.1 ZnSe | p. 843 |
35.2 ZnBeSe | p. 848 |
35.3 ZnO | p. 849 |
References | p. 851 |
36 II-VI Narrow-Bandgap Semiconductors for Optoelectronics | p. 855 |
36.1 Applications and Sensor Design | p. 858 |
36.2 Photoconductive Detectors in HgCdTe and Related Alloys | p. 860 |
36.3 Sprite Detectors | p. 864 |
36.4 Photoconductive Detectors in Closely Related Alloys | p. 866 |
36.5 Conclusions on Photoconductive HgCdTe Detectors | p. 867 |
36.6 Photovoltaic Devices in HgCdTe | p. 867 |
36.7 Emission Devices in II-VI Semiconductors | p. 882 |
36.8 Potential for Reduced-Dimensionality HgTe-CdTe | p. 883 |
References | p. 883 |
37 Optoelectronic Devices and Materials | p. 887 |
37.1 Introduction to Optoelectronic Devices | p. 888 |
37.2 Light-Emitting Diodes and Semiconductor Lasers | p. 890 |
37.3 Single-Mode Lasers | p. 904 |
37.4 Optical Amplifiers | p. 906 |
37.5 Modulators | p. 907 |
37.6 Photodetectors | p. 911 |
37.7 Conclusions | p. 914 |
References | p. 915 |
38 Liquid Crystals | p. 917 |
38.1 Introduction to Liquid Crystals | p. 917 |
38.2 The Basic Physics of Liquid Crystals | p. 924 |
38.3 Liquid-Crystal Devices | p. 931 |
38.4 Materials for Displays | p. 940 |
References | p. 949 |
39 Organic Photoconductors | p. 953 |
39.1 Chester Carlson and Xerography | p. 954 |
39.2 Operational Considerations and Critical Materials Properties | p. 956 |
39.3 OPC Characterization | p. 965 |
39.4 OPC Architecture and Composition | p. 967 |
39.5 Photoreceptor Fabrication | p. 976 |
39.6 Summary | p. 977 |
References | p. 978 |
40 Luminescent Materials | p. 983 |
40.1 Luminescent Centres | p. 985 |
40.2 Interaction with the Lattice | p. 987 |
40.3 Thermally Stimulated Luminescence | p. 989 |
40.4 Optically (Photo-)Stimulated Luminescence | p. 990 |
40.5 Experimental Techniques - Photoluminescence | p. 991 |
40.6 Applications | p. 992 |
40.7 Representative Phosphors | p. 995 |
References | p. 995 |
41 Nano-Engineered Tunable Photonic Crystals in the Near-IR and Visible Electromagnetic Spectrum | p. 997 |
41.1 PC Overview | p. 998 |
41.2 Traditional Fabrication Methodologies for Static PCs | p. 1001 |
41.3 Tunable PCs | p. 1011 |
41.4 Summary and Conclusions | p. 1014 |
References | p. 1015 |
42 Quantum Wells, Superlattices, and Band-Gap Engineering | p. 1021 |
42.1 Principles of Band-Gap Engineering and Quantum Confinement | p. 1022 |
42.2 Optoelectronic Properties of Quantum-Confined Structures | p. 1024 |
42.3 Emitters | p. 1032 |
42.4 Detectors | p. 1034 |
42.5 Modulators | p. 1036 |
42.6 Future Directions | p. 1037 |
42.7 Conclusions | p. 1038 |
References | p. 1038 |
43 Glasses for Photonic Integration | p. 1041 |
43.1 Main Attributes of Glasses as Photonic Materials | p. 1042 |
43.2 Glasses for Integrated Optics | p. 1050 |
43.3 Laser Glasses for Integrated Light Sources | p. 1053 |
43.4 Summary | p. 1057 |
References | p. 1059 |
44 Optical Monlinearity in Photonic Glasses | p. 1063 |
44.1 Third-Order Nonlinearity in Homogeneous Glass | p. 1064 |
44.2 Second-Order Nonlinearity in Poled Glass | p. 1069 |
44.3 Particle-Embedded Systems | p. 1070 |
44.4 Photoinduced Phenomena | p. 1071 |
44.5 Summary | p. 1072 |
References | p. 1072 |
45 Nonlinear Optoelectronic Materials | p. 1075 |
45.1 Background | p. 1075 |
45.2 Illumination-Dependent Refractive Index and Nonlinear Figures of Merit (FOM) | p. 1077 |
45.3 Bulk and Multi-Quantum-Well (MQW) Inorganic Crystalline Semiconductors | p. 1080 |
45.4 Organic Materials | p. 1084 |
45.5 Nanocrystals | p. 1087 |
45.6 Other Nonlinear Materials | p. 1088 |
45.7 Conclusions | p. 1089 |
References | p. 1089 |
Part E Novel Materials and Selected Applications | |
46 Solar Cells and Photovoltaics | p. 1095 |
46.1 Figures of Merit for Solar Cells | p. 1096 |
46.2 Crystalline Silicon | p. 1098 |
46.3 Amorphous Silicon | p. 1100 |
46.4 GaAs Solar Cells | p. 1101 |
46.5 CdTe Thin-Film Solar Cells | p. 1102 |
46.6 CulnGaSe[subscript 2] (CIGS) Thin-Film Solar Cells | p. 1103 |
46.7 Conclusions | p. 1104 |
References | p. 1105 |
47 Silicon on Mechanically Flexible Substrates for Large-Area Electronics | p. 1107 |
47.1 a-Si:H TFTs on Flexible Substrates | p. 1108 |
47.2 Field-Effect Transport in Amorphous Films | p. 1108 |
47.3 Electronic Transport Under Mechanical Stress | p. 1113 |
References | p. 1118 |
48 Photoconductors for X-Ray Image Detectors | p. 1121 |
48.1 X-Ray Photoconductors | p. 1123 |
48.2 Metrics of Detector Performance | p. 1131 |
48.3 Conclusion | p. 1136 |
References | p. 1136 |
49 Phase-Change Optical Recording | p. 1139 |
49.1 Digital Versatile Discs (DVDs) | p. 1140 |
49.2 Super-RENS Discs | p. 1144 |
49.3 In Lieu of Conclusion | p. 1145 |
References | p. 1145 |
50 Carbon Nanotubes and Bucky Materials | p. 1147 |
50.1 Carbon Nanotubes | p. 1147 |
50.2 Bucky Materials | p. 1153 |
References | p. 1153 |
51 Magnetic Information-Storage Materials | p. 1155 |
51.1 Magnetic Recording Technology | p. 1156 |
51.2 Magnetic Random-Access Memory | p. 1185 |
51.3 Extraordinary Magnetoresistance (EMR) | p. 1189 |
51.4 Summary | p. 1189 |
References | p. 1189 |
52 High-Temperature Superconductors | p. 1193 |
52.1 The Superconducting State | p. 1195 |
52.2 Cuprate High-T[subscript c] Superconductors: An Overview | p. 1202 |
52.3 Physical Properties of Cuprate Superconductors | p. 1207 |
52.4 Superconducting Films | p. 1212 |
52.5 The Special Case of MgB[subscript 2] | p. 1214 |
52.6 Summary | p. 1216 |
References | p. 1216 |
53 Molecular Electronics | p. 1219 |
53.1 Electrically Conductive Organic Compounds | p. 1220 |
53.2 Materials | p. 1223 |
53.3 Plastic Electronics | p. 1225 |
53.4 Molecular-Scale Electronics | p. 1229 |
53.5 DNA Electronics | p. 1235 |
53.6 Conclusions | p. 1236 |
References | p. 1237 |
54 Organic Materials for Chemical Sensing | p. 1241 |
54.1 Analyte Requirements | p. 1242 |
54.2 Brief Review of Inorganic Materials | p. 1243 |
54.3 Macrocylic Compounds for Sensing | p. 1245 |
54.4 Sensing with Phthalocyanine and Porphyrin | p. 1250 |
54.5 Polymeric Materials | p. 1255 |
54.6 Cavitand Molecules | p. 1259 |
54.7 Concluding Remarks | p. 1261 |
References | p. 1262 |
55 Packaging Materials | p. 1267 |
55.1 Package Applications | p. 1268 |
55.2 The Materials Challenge of Electronic Packaging | p. 1269 |
55.3 Materials Coefficient of Thermal Expansion | p. 1272 |
55.4 Wirebond Materials | p. 1272 |
55.5 Solder Interconnects | p. 1273 |
55.6 Substrates | p. 1278 |
55.7 Underfill and Encapsulants | p. 1280 |
55.8 Electrically Conductive Adhesives (ECAs) | p. 1281 |
55.9 Thermal Issues | p. 1283 |
55.10 Summary | p. 1284 |
References | p. 1285 |
Acknowledgements | p. 1287 |
About the Authors | p. 1291 |
Detailed Contents | p. 1307 |
Glossary of Defining Terms | p. 1333 |
Subject Index | p. 1367 |