Title:
Polymeric materials for microelectronic applications : science and technology
Series:
ACS symposium series; 579
Publication Information:
Washington, DC : American Chemical Society, 1994
ISBN:
9780841230552
Added Corporate Author:
Added Conference Author:
Available:*
Library | Item Barcode | Call Number | Material Type | Item Category 1 | Status |
|---|---|---|---|---|---|
Searching... | 30000003144585 | TK7871.15.P6 P643 1994 | Open Access Book | Proceedings, Conference, Workshop etc. | Searching... |
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Summary
Summary
Reports recent developments in polymer science and technology pertinent to microelectronics. Addresses such topics as photophysics and radiation physics and chemistry of polymers; photoresists, electron beam resists, and X-ray resists; insulating materials in microelectronics; photoresponsive materials; silicon-containing polymers; conducting polymers; and optoelectronic materials. Includes international contributions from both academia and industry.
Table of Contents
| Photophysics, Photochemistry, and Photo-optical Effects in Polymer SolidsK. Horie |
| Photochemistry of Liquid-Crystalline PolymersD. Creed and R. A. Coad and A.C. Griffin and C. E. Hoyle and L. Jin and P. Subramanian and S. V. Varma and K. Venkataram |
| Dissociative Electron Capture of Polymers with Bridging Acid Anhydrides: Matrix Isolation Electron Spin Resonance StudyP.H. Kasai |
| Luminescence Study of Ion-Irradiated Aromatic PolymersY.Aoki and H. Namba and F. Hosoi and S. Nagai |
| New Directions in the Design of Chemically Amplified ResistE.Reichmanis and M.E. Galvin and K. E. Uhrich and P. Mirau and S. A. Heffner: |
| Dual-Tone and Aqueous Base Developable Negative Resists Based on Acid-Catalyzed DehydrationH.Ito and Y. Maekawa |
| Importance of Donor-Acceptor Reactions for the Photogeneration of Acid in Chemically Amplified ResistsN.P. Hacker |
| Acid Generation in Chemivcally Amplified Resist FilmsT.Watanabe and Y. Yamashita and T. Kozawa and Y. Yoshida and S. Tagawa |
| Radiation-Induced Reactions of Onium Salts in NovolakT. Kozawa and M. Uesaka and T. Watanabe and Y.Yamashita and H. Shibata and Y. Yoshida and S. Tagawa |
| Polymeric Sulfonium Salts as Acid Generators for Excimer Laser LithographyK. Maeda and K. Nakano and E. Hasegawa |
| Application of Triaryl Phosphate to Photosensitive Materials: Photoreaction Mechanisms of Triaryl PhosphateI. Naito and A. Kinoshita and Y. Okamoto and S. Takamuku |
| Effect of Water on the Surface Insoluble Layer of Chemical Amplified Positive ResistsJ. Nakamura and H. Ban and Y. Kawai and A. Tanaka |
| Thermal Properties of a Chemically Amplified Resist ResinK. Asakawa and A. Hongu and N. Oyasato and M. Nakase |
| Modeling and Simulation of Chemically Amplified Resist SystemsA. Hongu and K. Asakawa and T. Ushirogouchi and H. Wakabayashi and S. Saito and M. Nakase |
| Surface Imaging Using Photoinduced Acid-Catalyzed Formation of Polysiloxanes at Air-Polymer InterfaceM. Shirai and T. Sumino and M. Tsunooka |
| Surface Imaging for Applications to Sub-0.35-mm LithographyK.-H. Baik and L. Van den hove |
| Molecular Design of Epoxy Resins for Microelectronics PackagingM. Kaji |
| Uniaxial and In-Plane Molecular Orientation of Polymides and Their Precursor: Studied by Absorption Dichroism of Perylenebisimide DyeM. Hasegawa and T. Matan and Y. Shindo and T. Sugimura |
| Novel Photosensitive Polyimide Precursor Based on Polyisoimide Using Nifedipine as A Dissolution InhibitorA. Mochizuki and T. Teraniishi and M. Ueda and T. Omote |
| Photochemical Behavior of Nifedipine Derivatives and Application to Photosensitsive PolyimidesT. Yamaoka and S. Yokoyama and T. Omote and K. Naitoh and K. Yoshida |
| Waveguiding in High-Temperature-Stable MaterialsC. Feger and S. Perutz and R. Reuter and J.E. McGrath and M. Osterfeld and H. Franke |
| Rodlike Fluorinated Polyimide as in In-Plane Birefringent Optical MaterialS. Ando and T. Sawada and Y. Inoue |
| Preparation of Polyphenylene and Copolymer for Microelectronics ApplicationsN.A. Johnen and H.K. Kim and C. K. Ober |
| Charge-Carrier Generation and Migration in a Polydiacetylene compound: Pulse Radiolysis, Time-Resolved Microwave Conductivity StudyG.P. van der Laan and M.P. de Haas and J.M. Warman and D.M. de Leeuw and J. Tsibouklis |
| Excitation Dynamics in Conjugated PolymersH.ssler and E.O. Gbel and A. Greiner and R. Kersting and H. Kurz and U. Lemmer and R.F. Mahrt and Y. Wada |
| Application of Polyaniline Films to Radiation DosimetryY. Oki and T. Suzuki and T. Miura and M. Numajiri and K. Kondo |
| Present and Future of Fullerenes: C60 nd TubulesK. Tanigaki |
| Photoresponsive Liquid-Crystalline Polymers: Holographic Storage, Digital Storage, and Holographic Optical ComponentsK. Anderle and J. H. Wendorff |
| Azimuthal Alighment Photocontrol of Piquid CrystalsK. Ichimura |
| Electronic Structure and UV Absorption Spectra of Permethylated Silicon ChainsH.S. Plitt and J.W. Downing and H. Teramae and M.K. Raymond and J. Michl |
| Electronic Properties of PolysilanesK. Seki and A.Yuyama and S. Narioka and H. Ishii and S. Hasegawa and H. Isaka and M. Fujino and M. Fujiki and N. Matsumoto and R. G. Kepler and Z.G Soos |
| UV Photoelectron Spectroscopy of Polysilanes and PolygermanesA. Watanabe and M. Matsuda and Y. Yosh |
