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Cover image for Advanced processes for 193-nm immersion lithography

Advanced processes for 193-nm immersion lithography

by

Wei, Yayi

Author

Wei, Yayi, Brainard, Robert L.

Format:

Call Number

TK7872.M3 W45 2009

Publisher

SPIE Publications,

Publication Date

2009

ISBN

9780819475572

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2.

Cover image for Dry etching for VLSI

Dry etching for VLSI

by

Roosmalen, A. J. Van

Author

Roosmalen, A. J. Van, Baggerman, J. A. G., Brader, S. J. H.

Format:

Call Number

TK7871.85.R58 1991

Publisher

Plenum Pr.,

Publication Date

1991

ISBN

9780306438356

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3.

Cover image for Applications of plasma processes to VLSI technology

Applications of plasma processes to VLSI technology

by

Sugano, Takuo

Author

Sugano, Takuo

Format:

Call Number

TK7871.85.A66 1985

Publisher

John Wiley,

Publication Date

1985

ISBN

9780471869603

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