Available:*
Library | Item Barcode | Call Number | Material Type | Item Category 1 | Status |
---|---|---|---|---|---|
Searching... | 30000002122319 | TK7872.T55 L83 1993 | Open Access Book | Book | Searching... |
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Summary
Summary
This reference reviews common film and plasma diagnostic techniques and the deposition and film properties of various hydrogenated amorphous silicon alloys (a-Si:H).;Drawing heavily from studies on a-Si:H solar cells and offering valuable insights into other semiconductor applications of a-Si:H and related alloys, Hydrogenated Amorphous Silicon Alloy Deposition Processes: describes conventional as well as alternative, deposition processes and compares the resulting material properties; systematically categorizes various a-Si:H deposition techniques; details the characteristics of a-Si:H and related alloys with both high and low optical bandgap, including a-SiC:H, a-SiGe:H, and a-SiSn:H; discusses basic designs of glow discharge deposition reactors; evaluates the etching properties of amorphous silicon-based alloys; and examines microcrystalline silicon and silicon carbide.;Providing over 825 literature citations for further study, Hydrogenated Amorphous Silicon Alloy Deposition Processes is an incomparable resource for physicists; materials scientists; chemical, process and production engineers; electrical engineers and technicians in the semiconductor industry; and upper-level undergraduate and graduate students in these disciplines.
Table of Contents
Introduction |
Material characteristics of amorphous silicon-based alloys |
Film diagnostic measurements |
Conventional glow discharge deposition processes for amorphous silicon-based alloys |
Design of glow discharge deposition reactors |
Glow discharge deposition parameters for hydrogenated amorphous silicon |
Glow discharge deposition reaction chemistry for hydrogenated amorphous silicon |
Modifications of conventional glow discharge |
Remote-plasma-assisted chemical vapour deposition |