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Library | Item Barcode | Call Number | Material Type | Item Category 1 | Status |
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Searching... | 30000010160678 | QD921 C79 2008 | Open Access Book | Proceedings, Conference, Workshop etc. | Searching... |
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Summary
Summary
In this book top experts treat general thermodynamic aspects of crystal fabrication; numerical simulation of industrial growth processes; commercial production of bulk silicon, compound semiconductors, scintillation and oxide crystals; X-ray characterization; and crystal machining. Also, the role of crystal technology for renewable energy and for saving energy is discussed. It will be useful for scientists and engineers involved in crystal and epilayer fabrication as well as for teachers and graduate students in material science, chemical and metallurgical engineering, and micro- and optoelectronics, including nanotechnology.
Author Notes
Professor Hans J. Scheel started the Scheel Consulting company in 2001 after retiring from the Swiss Federal Institute of Technology. Starting out with a chemical background, he has more than 40 years of experience with crystal growth and epitaxy in university as well as industry. For his achievements in bulk crystal growth and epitaxy technologies, he received awards from IBM and from Swiss, British, Korean Crystal Growth Associations, was elected member of the Russian Academy of Engineering Sciences, and received his D.Sc. from Tohoku University, Japan. He is co-author and editor of 6 books, author of more than 100 publications and patents, has organized international workshops on crystal technology and has been visiting professor at Osaka and Tohoku Universities, Japan, as well as Shandong University, China.
Dr. Peter Capper is a Materials Team Leader at SELEX Sensors and Airborne Systems Infrared Ltd (formerly BAE Systems), and has over 30 years of experience in the infrared material Cadmium Mercury Telluride (CMT). He holds the patent for the application of the accelerated crucible rotation technique to CMT growth and is recognised as a world authority on CMT. He has written and edited 6 books on electronic materials and devices. He has served on several International Advisory boards to conferences, acted as co-Chair at an E-MRS Symposium and a SPIE Symposium and has edited several conference proceedings for J. Crystal Growth and J. Materials Science. He is also currently on the editorial board of the Journal of Materials Science: Materials in Electronics.
Table of Contents
Preface |
List of Contributors |
Part I General Aspects of crystal Growth Technology |
1 Phase Diagrams for Crystal GrowthManfred Muhlberg |
2 Fundamentals of Equilibrium Thermodynamics of Crystal GrowthKlaus Jacobs |
3 Thermodynamics, Origin, and Control of DefectsPeter Rudolph |
4 Thermophysical Properties of Molten SiliconTaketoshi Hibiya and Hiroyuki Fukuyama and Takao Tsukada and Masahito Watanabe |
Part IISimulation of Industrial Growth Processes |
5 Yield Improvement and defect Control in Bridgman-Type Crystal Growth with the Aid of Thermal ModelingJochen Friedrich |
6 Modeling of Czochralski Growth of Large Silicon CrystalsVladimir Kalaev and Yuri Makarov and Alexander Zhmakin |
7 Global Analysis of Effects of Magnetic Field Configuration on Melt/Crystal Interface Shape and Melt Flow in a Cz-Si Crystal GrowthKoichi Kakimoto and Liun Liu |
8 Modeling of Semitransparent Bulk Crystal GrowthVladimir Kalaev and Yuri Makarov and Valentin Yuferev and Alexander Zhmakin |
Part IIICompound Semiconductors |
9 Recent Progress in GaAs Growth Technologies at FREIBERGERStefan Eichler and Frank Borner and Thomas Bunger and Manfred Jurisch and Andreas Kohler and Ullrich Kretzer and Max Scheffer-Czygan and Berndt Weinert and Tilo Flade |
10 Interface Stability and Its Impact on Control DynamicsFrank J. Bruni |
11 Use of Forced Mixing via the Accelerated Crucible Rotation Technique (ACRT) in Bridgman Growth of Cadmium Mercury Telluride (CMT)Peter Capper |
12 Crystal-Growth Technology for Ternary III-V Semiconductor Production by Vertical Bridgman and Vertical Gradient Freezing Methods with Accelerated Crucible Rotation TechniquePartha S. Dutta |
13 X-Ray Diffraction Imaging of Industrial CrystalsKeith Bowen and David Jacqus and Petra Feichtinger |
Part IV Scintillator Crystals |
14 Continuous Growth of Large Halide Scintillation CrystalsAlexander Gektin and Valentine Goriletskiy and Borys Zaslavskiy |
Part V Oxides |
15 Phase Equilibria and Growth of Langasite-Type CrystalsSatoshi Uda and Shou-Qi Wang and Hiromitsu Kimura and Xinming Huang |
16 Flame-Fusion (Verneuil) Growth of OxidesHans J. Scheel and Leonid Lytvynov |
Part VI Crystal Growth for Sustaining Energy |
17 Saving Energy and Renewable Energy Through Crystal TechnologyHans J. Scheel |
Part VII Crystal Machining |
18 Crystal Sawing TechnologyHans J. Moller |
19 Plasma Chemical Vaporization Machining and Elastic Emission MachiningYasuhisa Sano and Kazuya Yamamura and Hidekazu Mimura and Kazuto Yamauchi and Yuzo Mori |
Index |