Structural properties of hydrogenated amorphous silicon (a-Si:H) thin film grown via radio frequency plasma enhanced chemical vapor deposition (RF PECVD)

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Cover image for Structural properties of hydrogenated amorphous silicon (a-Si:H) thin film grown via radio frequency plasma enhanced chemical vapor deposition (RF PECVD)

Title:

Personal Author:

Hasbullah Anthony Hasbi

Publication Information:

2005

Physical Description:

1v + 1 CD-ROM

General Note:

Also available in compact disc version : CP 11786 ra

Supervisor : Assoc. Prof. Dr. Zulkafli Othaman

Subject Term:

Silicon

Amorphous semiconductors

Surface chemistry

Added Author:

Zulkafli Othaman, supervisor

Added Corporate Author:

Fakulti Sains

Electronic Access:

Preview

DSP_DISSERTATION:

Thesis (Sarjana Sains (Fizik)) - Universiti Teknologi Malaysia, 2005

Available:*

Library	Item Barcode	Call Number	Material Type	Item Category 1	Status
Searching... FS Library	FS300000005273	QC611.8.S5 H37 2005	Closed Access Thesis	UTM Master Thesis (Closed Access)	Searching... Unknown
Searching... Perpustakaan Raja Zarith Sofiah	30000010084685	QC611.8.S5 H37 2005	Closed Access Thesis	UTM Master Thesis (Closed Access)	Searching... Unknown
Searching... SPS Library	SPS30000001328	QC611.8.S5 H37 2005 raf	Closed Access Thesis	UTM Master Thesis (Closed Access)	Searching... Unknown

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