Cover image for Structural properties of hydrogenated amorphous silicon (a-Si:H) thin film grown via radio frequency plasma enhanced chemical vapor deposition (RF PECVD)
Title:
Structural properties of hydrogenated amorphous silicon (a-Si:H) thin film grown via radio frequency plasma enhanced chemical vapor deposition (RF PECVD)
Personal Author:
Hasbullah Anthony Hasbi
Publication Information:
Skudai : Universiti Teknologi Malaysia, 2005
Physical Description:
1 CD-ROM ; 12 cm.
General Note:
Also available in printed version : QC611.8.S5 H37 2005 raf
Subject Term:
Silicon

Amorphous semiconductors

Surface chemistry
DSP_DISSERTATION:
Thesis (Sarjana Sains (Fizik)) - Universiti Teknologi Malaysia, 2005

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 30000010084686 CP 11786 UTM Special Collection - Computer File Compact Disc Accompanies UTM Thesis/Project Paper
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