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Library | Item Barcode | Call Number | Material Type | Item Category 1 | Status |
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Searching... | 30000010237891 | TS695 G47 2008 | Open Access Book | Book | Searching... |
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Summary
Summary
Since 1980, when first applied in the new lamp industry, chemical vapour deposition has been employed in a diverse group of technologies (Jacobson, 1982). At present, CVD plays vital role in microelectronics, wear and radiation resistant coatings, fibre-optics, and the purification and fabrication of exotic materials, from ultra-low expansion glasses to high purity refractory metals. CVD has four major advantages over most other thin film deposition techniques. First, the process allows tight control over gas stream flow rate and composition which leads to predictable and repeatable film composition and graded structures, if desired. Second, the thermal activation of the reaction establishes thermal equilibrium at the site of film deposition, producing tight, highly co-ordinated structures. Third, the throwing power of CVD is excellent, allowing for the coating of less accessible surfaces such as the inside of tubes. Last, the are is especially well suited to the deposition of refractory materials which is difficult by other techniques.
Table of Contents
Preface |
Why Molybdenum for Spectrally Selective Surfaces |
Apcvd Technology of Oxychloride and Carbonyl Black Molybdenum |
Black Molybdenum Films Characterisation |
CVD Silicon Nitride Protective and Antireflecting Coating for Black Molybdenum Solar Absorbers |
Discussion of Optical Properties of Black Molybdenum Films |
Comparison of the Physical Properties of Carbonyl and Oxychloride Films |
Interpretation of the Results in Terms of the Bounds on the Effective Dielectric Function |
Applications of Black Molybdenum Solar Absorber Coatings |
Extended Lifetime-Stability Tests of Black Molybdenum Films Deposited on Metal Substrates |
Recent Development in the Area of Spectrally Selective Surfaces |
References |
Index |