Cover image for Development of very high frequency plasma enhanced chemical vapour deposition for nanostructure silicon carbide thin film deposition
Title:
Development of very high frequency plasma enhanced chemical vapour deposition for nanostructure silicon carbide thin film deposition
Publication Information:
Johor Bahru, Johor : Universiti Teknologi Malaysia, 2016
Physical Description:
xxvi, 226 pages : illustrations (some colors) ; 30 cm
General Note:
Also available in CD-ROM : CP 064586 ra

Supervisors : Dr. Abd. Kahmim Ismail, Prof. Dr. Samsudi Sakrani, Prof. Dr. Zulkafli Othaman, Prof. Dr. Yussof Wahab
Added Corporate Author:
DSP_DISSERTATION:
Thesis (Ph.D (Fizik)) - Universiti Teknologi Malaysia, 2016

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35000000023501 XX(863338.3) Closed Access Thesis UTM PhD Thesis (Closed Access)
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36000000001750 XX(863338.2) Closed Access Thesis UTM PhD Thesis (Open Shelves)
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