W. ZapkaN. ArnoldB. S. Luk'yanchuk and M. Mosbacher and Y. W. Zheng and H.-J. Munzer and S. M. Huang and M. Bertsch and W. D. Song and Z. B. Wang and Y. F. Lu and O. Dubbers and J. Boneberg and P. Leiderer and M. H. Hong and T. C. ChongD.M. Kane and A.J. Fernandes and D.R. HalfpennyC.P. Grigoropoulos and D. KimP. Leiderer and M. Mosbacher and V. Dobler and A. Schilling and O. Yavas and B.S. Luk'yanchuk and J. BonebergV. P. Veiko and E. A. ShakhnoV. ZafiropulosB. S. Luk'yanchuk and V. ZafiropulosM. Takai and N. Suzuki and O. YavasM. H. Hong and W. D. Song and Y. F. Lu and B. S. Luk'yanchuk and T. C. Chong

Preface	p. 1
Part 1. History
Chapter 1. The Road to "Steam Laser Cleaning"	p. 23
1. Meeting Andrew C. Tam	p. 23
2. A cleaning method needed	p. 24
3. 'Laser cleaning'	p. 26
4. 'Steam laser cleaning'	p. 29
5. Steam laser cleaning with short-pulse IR-lasers	p. 33
6. Steam laser cleaning: direct imaging of the jet motion	p. 34
7. Opto-acoustic detection of the liquid film explosion	p. 40
8. Steam laser cleaning: study of the mechanism of the liquid film explosion	p. 41
9. Stencil masks again	p. 45
Acknowledgement	p. 46
Thanks to Andrew C. Tam	p. 46
References	p. 46
Part 2. Dry Laser Cleaning
Chapter 2. Dry Laser Cleaning of Particles by Nanosecond Pulses: Theory	p. 51
1. Introduction	p. 51
2. Adhesion potential and equation of motion	p. 53
2.1. Model expression for elastic-VdW potential	p. 53
2.2. Parabolic approximation	p. 57
2.3. Equation for the evolution of deformation h	p. 58
2.4. Damping coefficient	p. 59
2.4.1. Knudsen viscosity	p. 59
2.4.2. Stokes viscosity	p. 59
2.4.3. Absorption of sound	p. 60
2.4.4. Emission of sound	p. 61
2.4.5. Plastic deformation	p. 61
3. Thermal expansion	p. 62
3.1. Hierarchy of scales	p. 62
3.2. General equations	p. 63
3.3. Unilateral quasi-static expansion	p. 65
3.4. 3D quasi-static expansion for finite beams with 1D heat conduction	p. 67
3.4.1. Comparison between different approximations	p. 68
3.5. Particle influence on the expansion of the substrate	p. 69
3.6. Unilateral dynamic expansion	p. 70
3.7. Thermal expansion of absorbing particle	p. 71
3.8. Transparent particle heated by the substrate	p. 72
3.9. Maximum energy of ejected particles	p. 72
4. Cleaning threshold	p. 73
4.1. General threshold conditions	p. 73
4.1.1. Short cleaning pulse	p. 74
4.1.2. Long cleaning pulse	p. 74
4.1.3. Over-damped movement	p. 75
4.1.4. Long pulses with steep fronts	p. 75
4.2. Single sinusoidal pulse in parabolic potential without damping	p. 76
4.3. Dependence of cleaning threshold on particle radius and pulse duration	p. 78
5. SiO[subscript 2] particles cleaned from Si wafers	p. 82
5.1. Experimental	p. 82
5.2. Cleaning threshold vs. radius	p. 83
5.3. Role of small oscillations in intensity	p. 86
5.4. Suggestions for cleaning experiments	p. 87
6. Conclusions	p. 89
Acknowledgements	p. 90
Appendix A. Quasi-static 3D thermal expansion	p. 90
Appendix B. Cleaning threshold with the single sinusoidal pulse	p. 95
References	p. 96
Chapter 3. Optical Resonance and Near-Field Effects in Dry Laser Cleaning	p. 103
1. Introduction	p. 103
2. Optical resonance and near-field effects within the Mie theory	p. 106
3. Particle on the surface. Beyond the Mie theory	p. 117
4. Adhesion potential and Hamaker-Lifshitz constant	p. 128
5. Temperature under the particle	p. 138
6. Dynamics of the particle, 3D effects	p. 144
7. Comparison with experimental results	p. 155
7.1. Local substrate ablation--a probe for optical near-fields	p. 155
7.1.1. Morphology of near field-induced damage sites	p. 156
7.1.2. Parameters influencing field enhancement induced ablation	p. 159
7.2. Near field effects in the laser cleaning process	p. 162
7.2.1. Experimental details	p. 162
7.2.2. Variation of the size parameter	p. 163
7.2.2.1. Variation of the particle size	p. 164
7.2.2.2. Variation of the laser wavelength	p. 167
7.2.3. Influence of incident angle	p. 168
7.2.4. Influence of surface roughness	p. 169
8. Conclusion	p. 170
Acknowledgements	p. 172
References	p. 172
Part 3. Steam Laser Cleaning
Chapter 4. Pulsed laser cleaning of particles from surfaces and optical materials	p. 181
1. Introduction	p. 181
2. Review tables of experimental pulsed laser cleaning of contaminants (mostly particles) from surfaces	p. 185
2.1. Overview of the information in the tables	p. 185
2.2. Silicon-wafers, hydrophilic and membrane masks	p. 190
2.3. Glass and related optical surfaces	p. 196
2.4. Other material surfaces	p. 198
3. Experimental studies of laser cleaning particles from glass at Macquarie University	p. 198
3.1. Single pulse laser cleaning studies	p. 198
3.1.1. "Dip and tap" sample preparation	p. 198
3.1.2. Dry/Damp laser cleaning	p. 199
3.1.3. Before and after images--microscope slides and fused silica	p. 211
3.2. Cleaning efficiency measured from optical microscopy images	p. 214
3.2.1. Particle de-agglomeration and removal	p. 214
3.2.2. Laser cleaning efficiency as a function of pulse fluence	p. 218
3.2.3. Laser cleaning threshold fluence measurement	p. 220
4. Concluding remarks	p. 222
Acknowledgments	p. 223
References	p. 223
Chapter 5. Liquid-Assisted Pulsed Laser Cleaning with Near Infrared and Ultraviolet-Pulsed Lasers	p. 229
1. Introduction	p. 229
2. Experiments	p. 232
2.1. Laser cleaning system and optical diagnostics	p. 232
2.2. Operation parameters and experimental procedures	p. 236
3. Experimental results	p. 236
3.1. Excimer laser cleaning	p. 236
3.2. Nd: YAG laser cleaning	p. 237
3.3. Summary of cleaning results	p. 240
4. Physical mechanisms	p. 241
4.1. In-situ monitoring of reflectance and visualization	p. 241
4.2. Temperature, pressure, and bubble dynamics	p. 242
5. Conclusion	p. 252
Acknowledgments	p. 252
References	p. 252
Chapter 6. Steam Laser Cleaning of Silicon Wafers: Laser Induced Bubble Nucleation and Efficiency Measurements	p. 255
1. Introduction	p. 256
2. Experimental	p. 257
2.1. Sample preparation	p. 258
2.2. Laser sources	p. 259
2.3. Surface plasmon probe and optical reflectance probe	p. 260
2.4. Scattered light probe	p. 262
2.5. Evaluation of the cleaning efficiency	p. 262
2.6. Determination of laser fluence	p. 263
3. Laser induced bubble nucleation and pressure generation	p. 264
3.1. Theoretical background	p. 265
3.1.1. Kinetic limit of superheating	p. 265
3.1.2. Nucleation theory	p. 267
3.2. Experiments on metal films	p. 272
3.2.1. Detection of bubble nucleation via SPP	p. 272
3.3. Bubble nucleation on silicon wafers	p. 282
3.3.1. Water at smooth silicon wafers	p. 283
3.3.2. Water at structured silicon substrates	p. 289
3.3.3. IPA on smooth silicon wafers	p. 292
3.4. Heat transfer coefficient	p. 292
4. Removal of particles on surfaces via laser induced bubble nucleation: steam laser cleaning	p. 294
4.1. Efficiency measurements	p. 296
4.1.1. Dependence on the number of applied laser pulses	p. 296
4.1.2. Dependence on the laser fluence and variation on the particle size	p. 298
4.2. Discussion and concluding remarks	p. 300
Acknowledgments	p. 304
References	p. 305
Chapter 7. Physical Mechanisms of Laser Cleaning	p. 311
1. Introduction	p. 311
2. Laser cleaning of the solid surface from particles	p. 312
2.1. Dry laser cleaning	p. 313
2.1.1. The cleaning force	p. 313
2.1.2. Surface cleaning condition	p. 316
2.1.3. Dry laser cleaning in the multipulse regime	p. 316
2.1.4. Discussion	p. 318
2.2. Steam laser cleaning	p. 319
2.2.1. Absorbing particles at the transparent substrate	p. 319
2.2.2. Transparent particles at the absorbing substrate	p. 321
2.2.3. Absorbing particles at the absorbing substrate	p. 326
2.2.4. Discussion	p. 327
3. Laser cleaning of the solid surface from films	p. 327
3.1. Laser cleaning by buckling mechanism	p. 328
3.1.1. The main regularities and regimes of film buckling	p. 329
3.1.2. Film ablation without melting before separation of the film fragment	p. 331
3.1.3. Ablation of the melting film	p. 331
3.1.4. Film degradation	p. 334
3.2. Laser cleaning by film shaking-off	p. 337
3.3. The conditions of action of shaking-off and buckling mechanisms of film ablation	p. 337
3.4. Other mechanisms of laser cleaning of solid surfaces from films	p. 338
4. Conclusion	p. 339
Acknowledgments	p. 340
References	p. 340
Part 4. Laser Cleaning of Artworks
Chapter 8. Laser Ablation in Cleaning of Artworks	p. 343
1. Introduction	p. 343
2. Laser ablation of complex polymerized materials	p. 344
2.1. Optimization of laser parameters	p. 344
2.1.1. Ablation efficiency studies	p. 346
2.1.2. Light transmission studies	p. 353
2.1.3. Chemical alteration of substrate	p. 355
2.2. Laser-assisted removal of aged varnish from paintings	p. 358
2.3. Laser-assisted removal of paint from composite materials	p. 365
3. Laser divestment of encrustation	p. 370
3.1. Major operative mechanisms and associated optical phenomena	p. 370
3.2. Removal of encrustation--test case studies	p. 380
4. Conclusions	p. 384
Acknowledgments	p. 385
References	p. 385
Chapter 9. On the Theory of Discoloration Effect in Pigments at Laser Cleaning	p. 393
1. Introduction	p. 393
2. The thermal ablation model	p. 395
3. Method of moments	p. 398
4. Thermal field within the ablated material. Numerical results	p. 402
5. Kinetics of phase transition and surface modification	p. 405
Acknowledgments	p. 411
References	p. 411
Part 5. Applications of Laser Cleaning
Chapter 10. Cleaning for Field Emitter Arrays	p. 417
1. Introduction	p. 417
2. Experimental procedures	p. 419
3. Laser light irradiation	p. 420
3.1. Laser irradiation modes	p. 420
3.1.1. Laser irradiation without field emission	p. 420
3.1.2. Laser irradiation with field emission	p. 422
3.2. IR and visible laser light ([lambda] = 1047 and 523.5 nm) irradiation	p. 422
3.3. UV laser light ([lambda] = 349 nm) irradiation	p. 422
3.4. UV laser light ([lambda] = 262 nm) irradiation	p. 429
4. Conclusions	p. 430
Acknowledgments	p. 431
References	p. 431
Chapter 11. Laser Cleaning of Organic Contamination on Microelectronic Devices and Process Real-Time Monitoring	p. 433
1. Introduction	p. 436
2. Experimental setup	p. 438
3. Results and discussion	p. 438
3.1. Laser cleaning of flexible circuit for inkjet printer cartridge	p. 438
3.2. Laser deflashing of IC packages	p. 441
3.3. Signal generation and diagnostics during the laser cleaning	p. 448
3.3.1. Audible acoustic wave generation	p. 451
3.3.2. Diagnostics of plasma-induced electric field	p. 456
3.3.3. Detection of plasma optical signal	p. 457
4. Conclusions	p. 460
Acknowledgments	p. 461
References	p. 461
Subject Index	p. 465